[논문]Intrinsic amorphous and microcrystalline siliconby hot-wire-deposition for thin films solar cell applications

 Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications

Stefan Kleina,b,*, Friedhelm Fingera, Reinhard Cariusa, Heribert Wagnera, Martin Stutzmannb

aInstitut fu¨r Photovoltaik, Forschungszentrum Ju¨lich, 52425 Ju¨lich, Germany
bWalter Schottky Institut, Technische Universita¨ t Mu¨nchen, Am Coulombwall, 85748 Garching, Germany

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Abstract
The influence of various deposition parameters on the electrical and optical properties and the structure of amorphous and
microcrystalline silicon films was investigated for material prepared by hot-wire (HW) CVD in a new multichamber deposition system, designed for the development of thin film solar cells. Prior to the material studies, careful measurement of the real substrate temperature under the influence of additional HW heating was performed. While good electronic quality and solar cell performance was found for a-Si:H layers, the mc-Si:H material showed very high spin densities, porosity and a characteristic structural inhomogeneity along the growth axis.
2001 Elsevier Science B.V. All rights reserved.

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Intrinsic amorphous and microcrystalline silicon by hot-wir.pdf